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Click to Enlarge		Magnetron Sputtering Cathodes Standard sizes 2”, 3”, 4”, and 6 “ circular and rectangular cathode size till 5” x 38” HV / UHV compatible with standard flanges High strength Rare earth and magnet module option allows Sputtering of Permeable materials Compatibility with DC, Pulsed DC or RF operation Integrated Argon gas inlet assembly Optimized turbulent water flow to provide uniform target cooling Low operating pressures UBM option available in all categories

Click to Enlarge		DC Sputtering Power Supply Available in 2.5, 5 and 40 kw versions. Capability of switching in three separate targets.

Click to Enlarge		Bi-Polar Power Supply for Micro-Arc Oxidation: Makes use of advanced high-frequency switching Technology The process employs alkaline electrolytes with PH in the range 8 -12 and is thus environmentally sound. Peak voltage up to 800 V Pulsed frequency up to10 KHz Duty cycle is continuously variable between 10% to 90% Power output up to 10 KW Active Arc suppression design Long duration up to 24 hrs. Continuous operation possible. Constant voltage / constant current operation possible 5.7" TFT color touch screen HMI with 6 function keys Small footprint