Table Top Sputtering System

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Table top sputter coater is available with single as well as dual cathode configuration. All Magnetron Sputtering Configurations are Sputter-down modes. The cathode typically uses standard 2” diameter target in clamp-on fashion. Cathode is equipped with independent shutter. Compact magnet plate makes use of rare earth magnets enabling high rates of deposition. The unit is provided with Pulsed DC power supply of 350 Watts/ 30 kHz. The cathode, however, is also compatible with RF power supply which can be supplied separately. Cathodes which can sputter magnetic materials such as Fe, Co etc. will be specifically supplied when demanded. Substrate stage can be supplied with facilities such as rotation, heater and electrical isolation for biasing purpose optionally. Cathodes that accept 3” diameter target can be provided on request.