Hot Filament Chemical Vapor Deposition For Dental Burrs

The Hot Filament Chemical Vapor Deposition System is designed to deposit Thin Films of Pure nano and microcrystalline Diamond films.

The system configuration is dedicatedly engineered to deposit pure diamond films for dental burr application. The system provides for Bias enhanced nucleation facility for HFCVD diamond incorporating all interlocks and safety features.

• Pure tungsten filaments of 0.3 mm wire diameter

• Variable Height Facility for Substrate Stage

• Mass flow controllers with intricately designed gas mixing and shower assembly for excellent control on gas chemistry

• Integrated Hot Filament  Stage Assembly with Thyristorized Power Supply

• High Temperature Compatible Substrate Assembly designed for 1000°C

• Constant Voltage Bias Power supply for Bias Enhanced nucleation